Origin(s) of Anomalous Substrate Conduction in MOVPE-Grown GaN HEMTs on Highly Resistive Silicon

نویسندگان

چکیده

The performance of transistors designed specifically for high-frequency applications is critically reliant upon the semi-insulating electrical properties substrate. suspected formation a conductive path radio frequency (RF) signals in highly resistive (HR) silicon substrate itself has been long held responsible suboptimal efficiency as-grown GaN high electron mobility (HEMTs) at higher operating frequencies. Here, we reveal that not one but two discrete channels distinguishable by their carrier type, spatial extent, and origin within metal-organic vapor phase epitaxy (MOVPE) growth process participate such parasitic conduction. An n-type layer forms first uniformly distributed substrate, it purely thermal origin. Alongside this, p-type localized on side AlN/Si interface induced diffusion group-III element precursor. Fortunately, maintaining sheet resistance this to values (∼2000 Ω/□) seems feasible with particular durations either organometallic precursor or ammonia gas predose Si surface, i.e., intentional introduction chemical just before nucleation. It proposed mechanism behind control actually relies disordered AlSiN between crystalline AlN nucleation

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ژورنال

عنوان ژورنال: ACS applied electronic materials

سال: 2021

ISSN: ['2637-6113']

DOI: https://doi.org/10.1021/acsaelm.0c00966